• DocumentCode
    1935327
  • Title

    A new lateral trench IGBT with p+ diverter having superior electrical characteristics

  • Author

    Goo Kang, Ey ; Hyun Moon, Seung ; Young Sung, Man

  • Author_Institution
    Dept. of Electr. Eng., Korea Univ., Seoul, South Korea
  • Volume
    2
  • fYear
    2001
  • fDate
    37165
  • Firstpage
    565
  • Abstract
    A new lateral trench insulated gate bipolar transistor (LTIGBT) with a p+ diverter was proposed to improve the characteristics of the conventional LTIGBT. The p+ divert layer was placed between the anode electrode region and cathode electrode. Generally, if the LTIGBT had a p+ divert region, the forward blocking voltage greatly decreased because the n-drift layer corresponding to the punch-through region was reduced. However, the forward blocking voltage of the proposed LTIGBT with a p+ diverter was about 140 V and the forward blocking voltage of the conventional LTIGBT of the same size was 105 V. The forward blocking voltage of LTIGBT with p+ diverter increased 1.3 times more than those of the conventional LTIGBT. As the p+ diverter region of the proposed device was an enclosed trench oxide layer, the electric field moved toward the trench-oxide layer and punch through breakdown of the LTIGBT with p+ diverter occurred. Therefore, the p+ diverter of the proposed LTIGBT did not relate to the breakdown voltage in a different way to the conventional LTIGBT. The latch-up current densities of the conventional LTIGBT and LTIGBT with p+ diverter were 540A/cm2 and 1453A/cm2, respectively. The enhanced latch-up capability of the LTIGBT with a p+ diverter was obtained through holes in the current directly reaching the cathode via the p+ divert region and the p+ cathode layer beneath the n+ cathode layer
  • Keywords
    current density; insulated gate bipolar transistors; power transistors; semiconductor device breakdown; semiconductor device models; 105 V; 140 V; LTIGBT; breakdown voltage; enclosed trench oxide layer; forward blocking voltage; latch-up current densities; lateral trench IGBT; lateral trench insulated gate bipolar transistor; n-drift layer; p+ divert layer; p+ diverter; punch through breakdown; punch-through region; trench-oxide layer; Anodes; Cathodes; Current density; Electric breakdown; Electric variables; Electrodes; Insulated gate bipolar transistors; Moon; Numerical simulation; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Conference, 2001. CAS 2001 Proceedings. International
  • Conference_Location
    Sinaia
  • Print_ISBN
    0-7803-6666-2
  • Type

    conf

  • DOI
    10.1109/SMICND.2001.967530
  • Filename
    967530