Title :
Optics selection by high magnification optical micrograph in bright field inspection
Author :
Chen, Chi-Min ; Chen, Yi-Chin ; Luoh, Tuung ; Yang, Ling-Wu ; Yang, Tahone ; Chen, Kuang-Chao ; Lu, Chih-Yuan
Author_Institution :
Technol. Dev. Center, Macronix Int. Co., Ltd., Hsinchu, Taiwan
Abstract :
Advanced bright field (BF) inspector have many functions to increase the defect signal, and suppress the background noise. However, it will take much time to fine tune an optimized BF inspection recipe. The aim of this paper is to propose a faster way to select the optimized optics.
Keywords :
inspection; optics; semiconductor device manufacture; semiconductor technology; BF inspection recipe; background noise; bright field inspection; high magnification optical micrograph; optics selection; semiconductor manufacturing process; wafer inspection; Bridges; Etching; Inspection; Light sources; Lighting; Monitoring; Bright Field inspection; Defect of interest; High Magnification Optical Micrograph; Nusiance; Optic selector;
Conference_Titel :
e-Manufacturing & Design Collaboration Symposium (eMDC), 2012
Conference_Location :
HsinChu
Print_ISBN :
978-1-4673-4540-8
DOI :
10.1109/eMDC.2012.6338437
