Title :
Sensitivities improvement by utilizing dark mode of bright filed inspection
Author :
Li, Hsiao-Leng ; Chung, Yen ; Hung, Che-Lung ; Luoh, Tuung ; Yang, Ling-Wu ; Yang, Tahone ; Chen, Kuang-Chou ; Lu, Chih-Yuan
Author_Institution :
Technol. Dev. Center, Macronix Int. Co. Ltd., Hsinchu, Taiwan
Abstract :
Advanced bright field (BF) inspection tool bundles with many powerful features to improve its resolution and sensitivity. However, it usually takes much time for creating an effective monitoring recipe for suppressing the background signal. This paper demonstrates the benefit of BF dark mode inspection for suppressing the interferences of nuisance and pre-layer.
Keywords :
inspection; semiconductor technology; BF dark mode inspection; BF inspection tool; background signal suppression; bright field inspection; nuisance interference suppression; prelayer interference suppression; sensitivity improvement; wafer noise; Broadband communication; Etching; Image edge detection; Inspection; Lighting; Monitoring; Sensitivity; Bright Field Inspection; Bright Mode; Dark Mode; Defect of Interest; Sensitivity;
Conference_Titel :
e-Manufacturing & Design Collaboration Symposium (eMDC), 2012
Conference_Location :
HsinChu
Print_ISBN :
978-1-4673-4540-8
DOI :
10.1109/eMDC.2012.6338439
