DocumentCode
1936600
Title
Invited speech: The practical manufacturing focus on the N20 & below
Author
Tang, Nail
Author_Institution
Synopsys Taiwan, Taiwan
fYear
2012
fDate
4-4 Sept. 2012
Firstpage
1
Lastpage
1
Abstract
Summary form only given. We are facing the great manufacturing challenge for the N20 and below. We observed the next generation lithography technology is delayed for the semi-conductor process requirement. There are soft technology that were pushing to applied for the delay to meat the future. We will show our focus on helping the recent development on the process modeling & FinFET device relative.
Keywords
lithography; semiconductor technology; FinFET device; field effect transistor; manufacturing focus; next generation lithography technology; process modeling; semiconductor process requirement; soft technology; Collaboration; Engineering profession; Graphics; Industries; Manufacturing; Nails; Speech;
fLanguage
English
Publisher
ieee
Conference_Titel
e-Manufacturing & Design Collaboration Symposium (eMDC), 2012
Conference_Location
HsinChu
Print_ISBN
978-1-4673-4540-8
Type
conf
DOI
10.1109/eMDC.2012.6338441
Filename
6338441
Link To Document