Title :
Analysis of electrical and optical properties of Ar and O/sub 2/ supermagnetron plasma
Author_Institution :
Res. Inst. of Electron., Shizuoka Univ., Johoku, Hamamatsu, Japan
Abstract :
Summary form only given. A supermagnetron plasma generator has been designed for the generation of high-density and high-uniformity magnetized plasma. It has two narrowly spaced parallel cathodes driven by split 13.56 MHz RF powers. Using the electropositive gas Ar and the electronegative gas O/sub 2/, supermagnetron plasmas were generated, and their electrical and optical properties were measured and analyzed. For the analysis of these properties, the self-bias voltage and RF voltage at the upper and lower cathodes and the optical emission intensities were measured.
Keywords :
plasma production; Ar; O/sub 2/; RF voltage; cathodes; electrical properties; magnetized plasma; optical emission intensities; optical properties; self-bias voltage; supermagnetron plasma; Anodes; Argon; Cathodes; Electrons; Plasma density; Plasma measurements; Plasma properties; Plasma sheaths; Stimulated emission; Voltage;
Conference_Titel :
Plasma Science, 1993. IEEE Conference Record - Abstracts., 1993 IEEE International Conference on
Conference_Location :
Vancouver, BC, Canada
Print_ISBN :
0-7803-1360-7
DOI :
10.1109/PLASMA.1993.593459
