DocumentCode :
1937468
Title :
Test vehicle for MCM-D interconnect process development
Author :
Westbrook, Scott
Author_Institution :
MicroModule Systems, Cupertino, CA, USA
fYear :
1993
fDate :
15-18 Mar 1993
Firstpage :
106
Lastpage :
110
Abstract :
A test vehicle that allows for the evaluation of DC interconnect parametrics of lines and vias is discussed. Defect assessment test structures are also included to electrically evaluate open and short defects and their apparent size. Interconnect parametrics include effective electrical linewidth, sheet resistance, and via resistance as a function of via size. Defect assessment structures are designed as multiple serpentine via string and line structures that aid in the unambiguous detection of defects. Such structures can also classify the apparent size of the defect. The data available from this vehicle show the degree of process control achieved and the potential yield of the interconnect for a product application
Keywords :
integrated circuit testing; metallisation; multichip modules; process control; DC interconnect parametrics; MCM-D interconnect process; defect assessment test structure; effective electrical linewidth; multiple serpentine via string; process control; sheet resistance; test vehicle; via resistance; via size; wafer scale IC process; Aluminum; Capacitance measurement; Conductive films; Electric resistance; Integrated circuit interconnections; Integrated circuit technology; Integrated circuit testing; Probes; Substrates; Vehicles;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Multi-Chip Module Conference, 1993. MCMC-93, Proceedings., 1993 IEEE
Conference_Location :
Santa Cruz, CA
Print_ISBN :
0-8186-3540-1
Type :
conf
DOI :
10.1109/MCMC.1993.302143
Filename :
302143
Link To Document :
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