Title :
Effect of Ge deposition rate on growth and optical properties of Ge(Si)/Si(001) self-assembled islands
Author :
Shaleev, Mikhail V. ; Krasilnik, Zakhary F. ; Lobanov, Dmitriy N. ; Novikov, Alexey V. ; Vostokov, Nikolay V. ; Yablonsky, A.N.
Author_Institution :
Inst. for Phys. of Microstruct., Nizhny Novgorod State Univ., Russia
Abstract :
In this paper we study the growth and photoluminescence spectra of GeSi/Si(001) self-assembled islands grown in wide range of Ge deposition rate (νGe=0.1÷0.75 Å/s). AFM studies of these structures revealed that for all Ge growth rates the dominant island species is the dome-shaped islands. It was found that the lateral size of dome islands is decreased and their surface density is increased with increasing of νGe. The decreasing of the lateral size is connected to increasing of Ge content in islands and part of surface occupied by the islands. The red-shift of the island related photoluminescence peak was observed during the island Ge growth rate increasing. This shift is associated with increasing of Ge content in islands.
Keywords :
atomic force microscopy; elemental semiconductors; germanium; island structure; molecular beam epitaxial growth; photoluminescence; self-assembly; semiconductor epitaxial layers; semiconductor growth; spectral line shift; surface morphology; AFM; Ge-Si; dome-shaped islands; gallium deposition rates; molecular beam epitaxial growth; optical properties; photoluminescence spectra; red shift; self-assembled islands; surface density; Atomic force microscopy; Epitaxial growth; Germanium; Photoluminescence; Semiconductor epitaxial layers; Semiconductor growth;
Conference_Titel :
Electron Devices and Materials, 2004. Proceedings. 5th Annual. 2004 International Siberian Workshop on
Print_ISBN :
5-7782-0463-9
DOI :
10.1109/PESC.2004.241011