• DocumentCode
    1938514
  • Title

    Adatom potential relief on Si (111) - 7×7 surface

  • Author

    Vershinin, Andrew V. ; Zverev, Alexey V. ; Shwartz, Natalia L. ; Yanovitskaja, Zoya Sh

  • Author_Institution
    Novosibirsk State Tech. Univ., Russia
  • fYear
    2004
  • fDate
    1-5 July 2004
  • Firstpage
    62
  • Lastpage
    65
  • Abstract
    Simulation of Adatom potential relief on Si (111) - 7×7 surface was carried out using Tersoff potential. Positions of adatom localization on reconstructed surface were determined. Three absolute energy minimums are found around each rest atom of the height H1=2.3 Å over lower monolayer of upper bilayer. Energy barriers of diffusion hops have been estimated: for hops around rest atom 0.75 eV, for hops from one rest atom to neighbor rest-atom 1.25 eV and for transition from one half-cell to the other 1.75 eV.
  • Keywords
    diffusion barriers; elemental semiconductors; monolayers; silicon; stacking faults; surface diffusion; surface phase transformations; surface potential; surface reconstruction; Si; Si (111) surface; Tersoff potential; adatom localization position; adatom potential relief; diffusion hops; energy barriers; monolayer; surface phase transition; surface reconstruction; Diffusion processes; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices and Materials, 2004. Proceedings. 5th Annual. 2004 International Siberian Workshop on
  • Print_ISBN
    5-7782-0463-9
  • Type

    conf

  • DOI
    10.1109/PESC.2004.241049
  • Filename
    1358292