Title : 
0.15 /spl mu/m InGaAs/AlGaAs/GaAs HEMT production process for high performance and high yield V-band power MMICs
         
        
            Author : 
Lai, R. ; Biedenbender, M. ; Lee, J. ; Tan, K. ; Streit, D. ; Liu, P.H. ; Hoppe, M. ; Allen, B.
         
        
            Author_Institution : 
Electron. Syst. & Technol. Div., TRW Inc., Redondo Beach, CA, USA
         
        
        
            fDate : 
Oct. 29 1995-Nov. 1 1995
         
        
        
        
            Abstract : 
We present a unique high yield, high performance 0.15 /spl mu/m HEMT production process which supports fabrication of MMW power MMICs up to 70 GHz. This process has been transferred successfully from an R&D process to TRW´s GaAs production line. This paper reports the on-wafer test results of more than 1300 V-band MMIC PA circuits measured over 24 wafers. The best 2-stage V-band power MMICs have demonstrated state-of-the-art performance with 9 dB power gain, 20% PAE and 330 mW output power. An excellent RF yield of 60% was achieved with an 8 dB power gain and 250 mW output power specification.
         
        
            Keywords : 
HEMT integrated circuits; III-V semiconductors; aluminium compounds; field effect MIMIC; gallium arsenide; indium compounds; power HEMT; power integrated circuits; semiconductor technology; 0.15 micron; 20 percent; 330 mW; 70 GHz; 9 dB; InGaAs-AlGaAs-GaAs; InGaAs/AlGaAs/GaAs HEMTs; PA circuits; PAE; RF yield; TRW production line; V-band MMW power MMICs; fabrication; on-wafer testing; output power; power gain; Circuit testing; Fabrication; Gallium arsenide; HEMTs; Indium gallium arsenide; MMICs; Performance gain; Power generation; Production; Radio frequency;
         
        
        
        
            Conference_Titel : 
Gallium Arsenide Integrated Circuit (GaAs IC) Symposium, 1995. Technical Digest 1995., 17th Annual IEEE
         
        
            Conference_Location : 
San Diego, CA, USA
         
        
            Print_ISBN : 
0-7803-2966-X
         
        
        
            DOI : 
10.1109/GAAS.1995.528972