• DocumentCode
    1939101
  • Title

    Understanding the cause of IV kink in GaAs MESFETs with two-dimensional numerical simulations

  • Author

    Wilson, M.R. ; Zdebel, I. ; Wennekers, P. ; Anholt, R.

  • Author_Institution
    Motorola Inc., Tempe, AZ, USA
  • fYear
    1995
  • fDate
    Oct. 29 1995-Nov. 1 1995
  • Firstpage
    109
  • Lastpage
    112
  • Abstract
    High performance GaAs MESFETs have been observed to exhibit kinks in their IV characteristics, particularly when high drain-source voltages are applied, Such characteristics make the design of circuits with high operating voltages difficult since this type of IV anomaly is typically not modeled by circuit simulators. This work has identified the cause of these kinks through the use of two-dimensional numerical device simulation with impact ionization. These simulations have also identified a potential device solution to IV kink. Furthermore, the results of this simulation work were verified by comparison with fabricated devices.
  • Keywords
    III-V semiconductors; Schottky gate field effect transistors; gallium arsenide; impact ionisation; semiconductor device models; GaAs; GaAs MESFETs; IV characteristics; drain-source voltage; impact ionization; kink; two-dimensional numerical simulation; Circuit simulation; Computational modeling; Digital control; Gallium arsenide; Impact ionization; Integrated circuit modeling; MESFET integrated circuits; Numerical simulation; Power supplies; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Gallium Arsenide Integrated Circuit (GaAs IC) Symposium, 1995. Technical Digest 1995., 17th Annual IEEE
  • Conference_Location
    San Diego, CA, USA
  • Print_ISBN
    0-7803-2966-X
  • Type

    conf

  • DOI
    10.1109/GAAS.1995.528973
  • Filename
    528973