Title :
Ion Beam Lithography
Author :
Stengl, Gerhard ; Löschner, Hans ; Hammel, Ernst ; Wolf, Edward D.
Author_Institution :
INS - Ion Microfabrication Systems GmbH, A - 1020 Vienna, Austria
Keywords :
Brightness; Electron beams; Ion beams; Ion sources; Lithography; Optical scattering; Particle beam optics; Production; Proximity effect; Resists;
Conference_Titel :
Solid State Device Research Conference, 1987. ESSDERC '87. 17th European
Conference_Location :
Bologna, Italy
