DocumentCode
1942326
Title
Impact of mask making imperfections on the performance of matching critical sub-circuit blocks
Author
Choi, L.J. ; Poulter, M. ; De Santis, 1. ; Cestra, G. ; Moberly, L. ; Gadepally, K. ; McCulloh, H. ; Beera, R. ; Garg, V. ; Green, K. ; Prater, J.
Author_Institution
Texas Instrum. Inc., Santa Clara, CA, USA
fYear
2012
fDate
19-22 March 2012
Firstpage
233
Lastpage
238
Abstract
In this paper, we present an investigation of the impact of mask making imperfections on matching. Comparing optically measured and electrically derived data for line width errors allows pinpointing whether or not the mask limits the best achievable device matching. Treating matching critical sub-circuit blocks themselves as test structures, we demonstrate a direct methodology for assessing the impact of process and mask on the performance of high-precision analog products.
Keywords
analogue circuits; integrated circuit testing; masks; critical subcircuit block matching; device matching; high-precision analog product; line width error; mask making imperfection; test structure; Bismuth; Capacitors; Computer languages; Optical device fabrication; Optical films; Resistors;
fLanguage
English
Publisher
ieee
Conference_Titel
Microelectronic Test Structures (ICMTS), 2012 IEEE International Conference on
Conference_Location
San Diego, CA
ISSN
1071-9032
Print_ISBN
978-1-4673-1027-7
Type
conf
DOI
10.1109/ICMTS.2012.6190654
Filename
6190654
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