• DocumentCode
    1942614
  • Title

    Study on Current Transport Mechanism in Amorphous SiC Emitter HBT

  • Author

    Sasaki, Klmlhiro ; Furukawa, Seijiro

  • Author_Institution
    Department of Applied Electronics, Graduate school of Sci, & Eng., Tokyo Inst. of Tech., 4259 Nagatsuda, Midori-ku, Yokohama 227, Japan
  • fYear
    1987
  • fDate
    14-17 Sept. 1987
  • Firstpage
    1055
  • Lastpage
    1058
  • Abstract
    Current transport model and current gain degradation mechanisms of a silicon heterojunction bipolar transistor with amorphous SiC emitter are discussed by observing various characteristics of amorphous SiC films as the emitter material. Under such study current gain is remarkably enhanced by using low resistance micro-crystalline Si, and current gain as high as 480 has been obtained.
  • Keywords
    Amorphous materials; Conductivity; Fabrication; Helium; Heterojunction bipolar transistors; Hydrogen; Optical films; Plasma measurements; Semiconductor films; Silicon carbide;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid State Device Research Conference, 1987. ESSDERC '87. 17th European
  • Conference_Location
    Bologna, Italy
  • Print_ISBN
    0444704779
  • Type

    conf

  • Filename
    5436815