DocumentCode :
1942790
Title :
850 nm VCSEL´s with buried Al/sub x/O/sub y/ current apertures
Author :
Chao-Kun Lin ; MacDougal, M.H. ; Geske, J. ; Bond, A.E. ; Won-Jin Choi ; Dapkus, P.D.
Author_Institution :
Dept. of Electr. Eng.-Electrophys., Univ. of Southern California, Los Angeles, CA, USA
fYear :
1997
fDate :
11-13 Aug. 1997
Firstpage :
15
Lastpage :
16
Abstract :
Vertical cavity surface emitting lasers (VCSELs) with 850 nm emission wavelength are of great interest for short haul optical interconnections because of the compatibility with standard Si or GaAs based receivers. Low current and high wall plug efficiency VCSELs are needed. In this presentation, 850nm GaAs-AlGaAs DBR QW VCSELs using buried Al/sub x/O/sub y/ current apertures with low threshold current and peak optical output of 1.2 mW are reported.
Keywords :
III-V semiconductors; aluminium compounds; distributed Bragg reflector lasers; gallium arsenide; infrared sources; laser cavity resonators; laser transitions; quantum well lasers; surface emitting lasers; 1.2 mW; 850 nm; GaAs-AlGaAs; GaAs-AlGaAs DBR QW VCSELs; VCSEL; buried Al/sub x/O/sub y/ current apertures; emission wavelength; high wall plug efficiency VCSELs; low current; low threshold current; peak optical output; short haul optical interconnections; vertical cavity surface emitting lasers; Apertures; Distributed Bragg reflectors; Gallium arsenide; Optical interconnections; Optical receivers; Optical surface waves; Plugs; Surface emitting lasers; Surface waves; Vertical cavity surface emitting lasers;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vertical-Cavity Lasers, Technologies for a Global Information Infrastructure, WDM Components Technology, Advanced Semiconductor Lasers and Applications, Gallium Nitride Materials, Processing, and Devi
Conference_Location :
Montreal, Que., Canada
Print_ISBN :
0-7803-3891-X
Type :
conf
DOI :
10.1109/LEOSST.1997.619083
Filename :
619083
Link To Document :
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