DocumentCode :
1942902
Title :
Strain Compensated Epitaxial Etchstop For Besoi
Author :
Maszara, W.P.
Author_Institution :
Allied-Signal Aerospace Co., Columbia, MD
fYear :
1992
fDate :
6-8 Oct. 1992
Firstpage :
6
Lastpage :
7
Keywords :
Atomic layer deposition; Boron; Capacitive sensors; Epitaxial layers; Etching; Optical films; Optical microscopy; Silicon; Strain measurement; Stress;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
SOI Conference, 1992. IEEE International
Conference_Location :
Ponte Vedra Beach, FL
ISSN :
1078-621X
Print_ISBN :
0-7803-7439-8
Type :
conf
DOI :
10.1109/SOI.1992.664769
Filename :
664769
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=1942902
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