DocumentCode
1943038
Title
Yield-Performance Considerations for Ion-Implanted GaAs Integrated Circuits based on Substrate Material Properties
Author
Lanzieri, C. ; Graffitti, R. ; Calori, C. ; Rapisarda, S. ; Cetronio, A.
Author_Institution
SELENIA Industrie Elettroniche Associate, Direzione Ricerche, Via Tiburtina, 00131 Roma, Italy.
fYear
1987
fDate
14-17 Sept. 1987
Firstpage
51
Lastpage
54
Abstract
In this article we will illustrate, in terms of yield-performance considerations, how for conventional annealing techniques the doped LEC materials (i.e. lightly Cr or In-doped) prove to be better than the undoped material, primarly because of the higher yield capability, and that before full advantage can be taken from the potentially better undoped material then either an improved annealing technique and/or ingot annealed material must be considered.
Keywords
Annealing; Chromium; FET integrated circuits; Frequency; Gallium arsenide; High speed integrated circuits; Implants; Integrated circuit yield; Intrusion detection; Material properties;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid State Device Research Conference, 1987. ESSDERC '87. 17th European
Conference_Location
Bologna, Italy
Print_ISBN
0444704779
Type
conf
Filename
5436837
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