DocumentCode :
1943038
Title :
Yield-Performance Considerations for Ion-Implanted GaAs Integrated Circuits based on Substrate Material Properties
Author :
Lanzieri, C. ; Graffitti, R. ; Calori, C. ; Rapisarda, S. ; Cetronio, A.
Author_Institution :
SELENIA Industrie Elettroniche Associate, Direzione Ricerche, Via Tiburtina, 00131 Roma, Italy.
fYear :
1987
fDate :
14-17 Sept. 1987
Firstpage :
51
Lastpage :
54
Abstract :
In this article we will illustrate, in terms of yield-performance considerations, how for conventional annealing techniques the doped LEC materials (i.e. lightly Cr or In-doped) prove to be better than the undoped material, primarly because of the higher yield capability, and that before full advantage can be taken from the potentially better undoped material then either an improved annealing technique and/or ingot annealed material must be considered.
Keywords :
Annealing; Chromium; FET integrated circuits; Frequency; Gallium arsenide; High speed integrated circuits; Implants; Integrated circuit yield; Intrusion detection; Material properties;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid State Device Research Conference, 1987. ESSDERC '87. 17th European
Conference_Location :
Bologna, Italy
Print_ISBN :
0444704779
Type :
conf
Filename :
5436837
Link To Document :
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