• DocumentCode
    1943038
  • Title

    Yield-Performance Considerations for Ion-Implanted GaAs Integrated Circuits based on Substrate Material Properties

  • Author

    Lanzieri, C. ; Graffitti, R. ; Calori, C. ; Rapisarda, S. ; Cetronio, A.

  • Author_Institution
    SELENIA Industrie Elettroniche Associate, Direzione Ricerche, Via Tiburtina, 00131 Roma, Italy.
  • fYear
    1987
  • fDate
    14-17 Sept. 1987
  • Firstpage
    51
  • Lastpage
    54
  • Abstract
    In this article we will illustrate, in terms of yield-performance considerations, how for conventional annealing techniques the doped LEC materials (i.e. lightly Cr or In-doped) prove to be better than the undoped material, primarly because of the higher yield capability, and that before full advantage can be taken from the potentially better undoped material then either an improved annealing technique and/or ingot annealed material must be considered.
  • Keywords
    Annealing; Chromium; FET integrated circuits; Frequency; Gallium arsenide; High speed integrated circuits; Implants; Integrated circuit yield; Intrusion detection; Material properties;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid State Device Research Conference, 1987. ESSDERC '87. 17th European
  • Conference_Location
    Bologna, Italy
  • Print_ISBN
    0444704779
  • Type

    conf

  • Filename
    5436837