• DocumentCode
    1943284
  • Title

    CMOS-Technology - Status, Trends and Applications

  • Author

    Neppl, F. ; Pfleiderer, H.-J.

  • Author_Institution
    Siemens AG, Corporate Research and Development, Microelectronics, Otto-Hahn-Ring 6, D-800 Mÿnchen 83, F.R.G.
  • fYear
    1988
  • fDate
    13-16 Sept. 1988
  • Abstract
    Todays CMOS technology is reviewed with respect to process architecture, acquired CMOS specific device know-how, design and applications. The process and device related problems of further miniaturization are discussed. Trends of innovative device design and technology concepts able to overcome these problems are summarized. Finally examples are given for future CMOS applications.
  • Keywords
    CMOS process; CMOS technology; Circuit noise; Hot carriers; Lithography; MOS devices; Marketing and sales; Power dissipation; Substrates; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid State Device Research Conference, 1988. ESSDERC '88. 18th European
  • Conference_Location
    Montpellier, France
  • Print_ISBN
    2868830994
  • Type

    conf

  • Filename
    5436848
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1943284