Plasma processing

Summary form only given. The author discusses gas discharge plasmas and the development of plasmas as a key technology in materials processing. The focus is on the use of plasmas in electronic materials processing, especially etching of thin films. The author considers the range of problems that need to be addressed in this technology, with an emphasis on the role that plasma science can play in attacking problems that remain unresolved. An example of a problem faced by plasma process and design engineers is the rapid pace of process and plasma tool development, driven by short product development and cycle times in the industry. The author also presents some results from his own research group in the area of direct atomistic simulations of reactive plasma-surface interactions.