DocumentCode :
1943676
Title :
Investigation of Charge Transport in Amorphous Ge2Sb2Te5 Using the Variable-Range Hopping Model
Author :
Piccinini, Enrico ; Buscemi, Fabrizio ; Tsafack, Thierry ; Rudan, Massimo ; Brunetti, Rossella ; Jacoboni, Carlo
Author_Institution :
Dept. of Electron., Univ. of Bologna, Bologna, Italy
fYear :
2009
fDate :
9-11 Sept. 2009
Firstpage :
1
Lastpage :
4
Abstract :
Chalcogenide GST materials can suitably be exploited for manufacturing phase-change memory devices. In this paper a transport model for the amorphous phase of GST is investigated, based on the variable-range hopping model. The model is implemented into a Monte Carlo current-driven simulation of a test device made of a layer of amorphous Ge2Sb2Te5 in contact with two planar metallic electrodes. The mechanisms governing electron transport within the device are discussed in relation to the variation of physical parameters, such as operating current, trap density, and coupling with the electric field inside the device.
Keywords :
Monte Carlo methods; amorphous semiconductors; antimony compounds; current density; electrodes; germanium compounds; hopping conduction; phase change memories; semiconductor thin films; tellurium compounds; Ge2Sb2Te5; Monte Carlo current-driven simulation; amorphous phase; chalcogenide material layer; charge transport; current density; electric field; electron transport; phase-change memory devices; planar metallic electrodes; trap density; variable-range hopping model; Amorphous materials; Computer science; Contacts; Crystalline materials; Electron traps; Jacobian matrices; Phase change memory; Reservoirs; Testing; Threshold voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Simulation of Semiconductor Processes and Devices, 2009. SISPAD '09. International Conference on
Conference_Location :
San Diego, CA
ISSN :
1946-1569
Print_ISBN :
978-1-4244-3974-8
Electronic_ISBN :
1946-1569
Type :
conf
DOI :
10.1109/SISPAD.2009.5290207
Filename :
5290207
Link To Document :
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