DocumentCode
1943696
Title
TCAD Investigation of Abnormal Degradation of Inhibited Cells in NAND Flash Structures
Author
Postel-Pellerin, J. ; Lalande, F. ; Canet, P. ; Bouchakour, R. ; Jeuland, F. ; Bertello, B. ; Villard, B.
Author_Institution
Inst. Mater. Microelectron. et Nanosci. de Provence, Aix-Marseille Univ., Marseille, France
fYear
2009
fDate
9-11 Sept. 2009
Firstpage
1
Lastpage
3
Abstract
In this paper, we propose to investigate the abnormal degradation on inhibited cells in NAND structures when cycling the addressed cell. The impact of the electric field is first explored and shows that the electric field isn\´t the main source of degradation. Then we try to identify the phenomenon occurring in the inhibition phase called "channel boosting". To visualize the potential in the channel area, a 2D TCAD simulation, emulating a 3D behavior by taking into account parasitic capacitances in the array, is developed and calibrated. We succeed in reproducing the bias conditions in the inhibited cell and to observe the emergence of a source/drain bias during the rising of potentials.
Keywords
NAND circuits; flash memories; technology CAD (electronics); NAND flash structure; TCAD investigation; channel boosting phenomenon; electric field impact; inhibited cell degradation; parasitic capacitance; source-drain bias; Boosting; Degradation; Flash memory; Leakage current; Nanoscale devices; Parasitic capacitance; Polarization; Stress; Threshold voltage; Visualization;
fLanguage
English
Publisher
ieee
Conference_Titel
Simulation of Semiconductor Processes and Devices, 2009. SISPAD '09. International Conference on
Conference_Location
San Diego, CA
ISSN
1946-1569
Print_ISBN
978-1-4244-3974-8
Electronic_ISBN
1946-1569
Type
conf
DOI
10.1109/SISPAD.2009.5290208
Filename
5290208
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