• DocumentCode
    1943696
  • Title

    TCAD Investigation of Abnormal Degradation of Inhibited Cells in NAND Flash Structures

  • Author

    Postel-Pellerin, J. ; Lalande, F. ; Canet, P. ; Bouchakour, R. ; Jeuland, F. ; Bertello, B. ; Villard, B.

  • Author_Institution
    Inst. Mater. Microelectron. et Nanosci. de Provence, Aix-Marseille Univ., Marseille, France
  • fYear
    2009
  • fDate
    9-11 Sept. 2009
  • Firstpage
    1
  • Lastpage
    3
  • Abstract
    In this paper, we propose to investigate the abnormal degradation on inhibited cells in NAND structures when cycling the addressed cell. The impact of the electric field is first explored and shows that the electric field isn\´t the main source of degradation. Then we try to identify the phenomenon occurring in the inhibition phase called "channel boosting". To visualize the potential in the channel area, a 2D TCAD simulation, emulating a 3D behavior by taking into account parasitic capacitances in the array, is developed and calibrated. We succeed in reproducing the bias conditions in the inhibited cell and to observe the emergence of a source/drain bias during the rising of potentials.
  • Keywords
    NAND circuits; flash memories; technology CAD (electronics); NAND flash structure; TCAD investigation; channel boosting phenomenon; electric field impact; inhibited cell degradation; parasitic capacitance; source-drain bias; Boosting; Degradation; Flash memory; Leakage current; Nanoscale devices; Parasitic capacitance; Polarization; Stress; Threshold voltage; Visualization;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Simulation of Semiconductor Processes and Devices, 2009. SISPAD '09. International Conference on
  • Conference_Location
    San Diego, CA
  • ISSN
    1946-1569
  • Print_ISBN
    978-1-4244-3974-8
  • Electronic_ISBN
    1946-1569
  • Type

    conf

  • DOI
    10.1109/SISPAD.2009.5290208
  • Filename
    5290208