DocumentCode :
1943696
Title :
TCAD Investigation of Abnormal Degradation of Inhibited Cells in NAND Flash Structures
Author :
Postel-Pellerin, J. ; Lalande, F. ; Canet, P. ; Bouchakour, R. ; Jeuland, F. ; Bertello, B. ; Villard, B.
Author_Institution :
Inst. Mater. Microelectron. et Nanosci. de Provence, Aix-Marseille Univ., Marseille, France
fYear :
2009
fDate :
9-11 Sept. 2009
Firstpage :
1
Lastpage :
3
Abstract :
In this paper, we propose to investigate the abnormal degradation on inhibited cells in NAND structures when cycling the addressed cell. The impact of the electric field is first explored and shows that the electric field isn\´t the main source of degradation. Then we try to identify the phenomenon occurring in the inhibition phase called "channel boosting". To visualize the potential in the channel area, a 2D TCAD simulation, emulating a 3D behavior by taking into account parasitic capacitances in the array, is developed and calibrated. We succeed in reproducing the bias conditions in the inhibited cell and to observe the emergence of a source/drain bias during the rising of potentials.
Keywords :
NAND circuits; flash memories; technology CAD (electronics); NAND flash structure; TCAD investigation; channel boosting phenomenon; electric field impact; inhibited cell degradation; parasitic capacitance; source-drain bias; Boosting; Degradation; Flash memory; Leakage current; Nanoscale devices; Parasitic capacitance; Polarization; Stress; Threshold voltage; Visualization;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Simulation of Semiconductor Processes and Devices, 2009. SISPAD '09. International Conference on
Conference_Location :
San Diego, CA
ISSN :
1946-1569
Print_ISBN :
978-1-4244-3974-8
Electronic_ISBN :
1946-1569
Type :
conf
DOI :
10.1109/SISPAD.2009.5290208
Filename :
5290208
Link To Document :
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