Dense plasma focus X-ray source for sub-micron lithography

Summary form only given. A discharge-driven, dense plasma focus in neon is under development at SRL (Science Research Laboratory) for use as a point X-ray source for submicron lithography. This source is presently capable of delivering /spl sim/13J/pulse of neon K-shell X-rays (8-14 /spl Aring/) into 4/spl pi/ steradians with 2 kJ of electrical energy stored in the capacitor bank charged to 9 kV at a pulse repetition rate of 2 Hz. The discharge is produced by a /spl les/4 kJ, /spl les/12 kV, capacitor bank circuit, which has a fixed inductance of 12 nH and drives /spl les/240 kA currents into the DPF load, with /spl ap/1.1 /spl mu/s rise-times. X-rays are produced when a dense pinch of neon is formed along the axis of the DPF electrodes. A new rail-gap switched capacitor bank and DPF have been built, designed for continuous operation at 2 Hz and burst mode operation at 20 Hz. Measurements of the X-ray output at a repetition rate of 2 Hz using the new capacitor bank have been performed, along with measurements of the spot size (0.3-0.8 mm) and the spectrum (8-14 /spl Aring/) of the DPF source.