DocumentCode :
1943755
Title :
An Investigation on Effective Mobility in Nanowire FETs under Quasi-Ballistic Conditions
Author :
Gnani, Elena ; Gnudi, Antonio ; Reggiani, Susanna ; Baccarani, Giorgio
Author_Institution :
ARCES, Univ. of Bologna, Bologna, Italy
fYear :
2009
fDate :
9-11 Sept. 2009
Firstpage :
1
Lastpage :
4
Abstract :
In this work we investigate the electron mobility in nanowire FETs operating under quasi-ballistic conditions. Starting from a general expression of the current-voltage characteristics worked out in a previous paper, we extract the drain current at vanishingly-low drain voltages and find the functional dependence of the effective mobility on the device length, the mean-free path and the barrier height. The resulting expression is nonlocal for short gate lengths, but may be useful for the interpretation of experimental measurements. The main result of this work is that the combined effect of acoustic-phonon and surface-roughness scattering leads to a nearly uniform mean-free path, at least for nanowire FETs with a diameter around 5 nm. Thus, mobility degradation at large gate voltages is predominantly due to carrier degeneracy, rather than an enhanced scattering rate.
Keywords :
electron mobility; field effect transistors; nanowires; surface roughness; surface scattering; acoustic-phonon effect; barrier height; carrier degeneracy; current-voltage characteristics; drain current extraction; electron mobility; nanowire FET operation; quasiballistic condition; short gate length; surface-roughness scattering; uniform mean-free path; Acoustic scattering; Electrical resistance measurement; Electron mobility; Equations; FETs; Length measurement; Magnetic field measurement; Optical scattering; Silicon; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Simulation of Semiconductor Processes and Devices, 2009. SISPAD '09. International Conference on
Conference_Location :
San Diego, CA
ISSN :
1946-1569
Print_ISBN :
978-1-4244-3974-8
Electronic_ISBN :
1946-1569
Type :
conf
DOI :
10.1109/SISPAD.2009.5290210
Filename :
5290210
Link To Document :
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