DocumentCode :
1943824
Title :
Transient 3D Simulation of Single Event Latchup in Deep Submicron CMOS-SRAMs
Author :
Gawlina, Y. ; Borucki, L. ; Georgakos, G. ; Wachutka, G.
Author_Institution :
Infineon Technol. AG, Munich, Germany
fYear :
2009
fDate :
9-11 Sept. 2009
Firstpage :
1
Lastpage :
4
Abstract :
Using transient 3D simulations we investigated single event latchups in SRAMs caused by cosmic radiation. The device structure considered comprises n-well, p-substrate, and source regions of NMOS and PMOS transistors fabricated in 65 nm technology. In particular, we analyzed the charge deposition and subsequent current flow caused by impinging ions with varying impact energy, device temperature, supply voltage and location of the ion impact in order to reveal the details of the failure and eventual destruction mechanisms.
Keywords :
CMOS memory circuits; MOSFET; SRAM chips; flip-flops; NMOS transistor; PMOS transistor; charge deposition analysis; cosmic radiation; deep submicron CMOS-SRAM; single event latchup; size 65 nm; supply voltage; transient 3D simulation; Discrete event simulation;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Simulation of Semiconductor Processes and Devices, 2009. SISPAD '09. International Conference on
Conference_Location :
San Diego, CA
ISSN :
1946-1569
Print_ISBN :
978-1-4244-3974-8
Electronic_ISBN :
1946-1569
Type :
conf
DOI :
10.1109/SISPAD.2009.5290213
Filename :
5290213
Link To Document :
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