DocumentCode
1944371
Title
A new measurement system with a virtual gray level pattern
Author
Yeh-fen Fu ; Lih-horng Shyu
Author_Institution
Dept. of Manage. Inf. Sci., Chung Kuo Inst. of Technol. & Commerce, Taipei, Taiwan
Volume
1
fYear
2001
fDate
15-19 July 2001
Abstract
In this paper, an equivalent gray level pattern with a small period has been proposed, based on the concept of geometrical variety and associated with the manufacturing process of a semiconductor optical mask. High precision displacement measurement is achieved by a phase-detecting technology. The experimental results show that the concept is feasible.
Keywords
CCD image sensors; Gray codes; displacement measurement; image processing equipment; masks; CCD camera; binary optical mask; charge injection sensor; displacement measurement; equivalent gray level pattern; geometrical variety; gray coding pattern; phase-detecting technology; semiconductor optical mask manufacturing process; virtual gray level pattern measurement; Charge coupled devices; Detectors; Geometrical optics; Information management; Lenses; Object detection; Printers; Semiconductor device manufacture; Sensor arrays; Signal processing;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 2001. CLEO/Pacific Rim 2001. The 4th Pacific Rim Conference on
Conference_Location
Chiba, Japan
Print_ISBN
0-7803-6738-3
Type
conf
DOI
10.1109/CLEOPR.2001.967931
Filename
967931
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