Title :
Thermal degradation of sputtered Al/Ni(V)/Cu-UBM in Pb-free flip chip solder joints connected to substrate with different surface finishes
Author :
Osenbach, J. ; Bachman, M. ; Crouthamel, D. ; Amin, A. ; Weachock, R. ; Delucca, J. ; Baiocch, F.
Author_Institution :
LSI Corp., Allentown, PA
Abstract :
The thermal stability of flip chip solder joints made with Al/Ni(V)/Cu-UBM and SAC-405 solder bumps on substrates with either electroless Ni(P)-immersion gold (ENIG) or Cu surface finish (Cu-SOP) was determined at 170C. On ENIG, the resistance changed by more than one order of magnitude after 400 hours of high temperature storage, whereas on Cu-SOP, no change in resistance was observed up to 2400 hours of aging. The detailed electrical characterization of the solder joints was supplemented with time dependent physical characterization (microstructure and materials composition) of the joint using scanning electron microscopy (SEM), energy dispersive spectroscopy (EDS), focused ion beam microscopy (FIB), and transmission electron microscopy (TEM). The microstructural characterization clearly showed that electrical degradation of the ENIG devices was a direct result of the conversion and interfacial oxidation of the as deposited Ni(V)-barrier UBM layer into a porous layer that contained a web like fine grain V3Sn IMC. This conversion was driven by the Au from the ENIG surface finish. The results were similar to that reported by the authors for eutectic PbSn solder bumps, the exception being that for ENIG surface finish the resistance stability of SAC solder was 25x greater than eutectic that for PnSn solder.
Keywords :
X-ray chemical analysis; ageing; aluminium; copper; electrical resistivity; flip-chip devices; focused ion beam technology; metallisation; nickel; oxidation; scanning electron microscopy; solders; surface finishing; thermal stability; transmission electron microscopy; vanadium; Al-Ni-Cu; Al-V-Cu; aging; energy dispersive spectroscopy; eutectic solder bumps; flip chip solder joints; focused ion beam microscopy; interfacial oxidation; resistance stability; scanning electron microspcopy; surface finish; thermal stability; time 2400 hour; time 400 hour; transmission electron microscopy; under bump metallization; Electric resistance; Electron beams; Flip chip solder joints; Gold; Scanning electron microscopy; Surface finishing; Surface resistance; Thermal degradation; Thermal stability; Transmission electron microscopy;
Conference_Titel :
Electronic Components and Technology Conference, 2008. ECTC 2008. 58th
Conference_Location :
Lake Buena Vista, FL
Print_ISBN :
978-1-4244-2230-2
Electronic_ISBN :
0569-5503
DOI :
10.1109/ECTC.2008.4549958