DocumentCode :
1944595
Title :
A Discrete Surface Potential Model Which Accurately Reflects Channel Doping Profile and Its Application to Ultra-Fast Analysis of Random Dopant Fluctuation
Author :
Sakamoto, Hironori ; Arimoto, Hiroshi ; Masuda, Hiroo ; Funayama, Satoshi ; Kumashiro, Shigetaka
Author_Institution :
MIRAI-Selete, Sagamihara, Japan
fYear :
2009
fDate :
9-11 Sept. 2009
Firstpage :
1
Lastpage :
4
Abstract :
A discrete surface potential model which accurately reflects channel doping profile is proposed. The proposed model is an improvement from the previously proposed model in order to accurately calculate drain current in full bias region using the same mobility and velocity saturation models as TCAD. Since the proposed model is a kind of first-principal-compact-model without any unphysical fitting parameters, it can become micro-TCAD which is a by far faster and lighter substitute for conventional TCAD. As an application of the proposed model, ultra-fast calculation of threshold voltage variation induced by random dopant fluctuation using Monte-Carlo method is introduced.
Keywords :
MOSFET; Monte Carlo methods; doping profiles; random processes; semiconductor device models; semiconductor doping; surface potential; technology CAD (electronics); Monte-Carlo method; TCAD; channel doping profile; discrete surface potential model; drain current; first-principal-compact-model; random dopant fluctuation; Channel bank filters; Doping profiles; Electronic mail; Fluctuations; MOSFET circuits; Poisson equations; Predictive models; Semiconductor process modeling; Surface fitting; Threshold voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Simulation of Semiconductor Processes and Devices, 2009. SISPAD '09. International Conference on
Conference_Location :
San Diego, CA
ISSN :
1946-1569
Print_ISBN :
978-1-4244-3974-8
Electronic_ISBN :
1946-1569
Type :
conf
DOI :
10.1109/SISPAD.2009.5290242
Filename :
5290242
Link To Document :
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