• DocumentCode
    1945439
  • Title

    Nanosecond-scale spectroscopy of vacuum ultraviolet emission from pulsed atmospheric discharges

  • Author

    Laity, G. ; Neuber, A. ; Fierro, A. ; Dickens, J. ; Hatfield, L.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Texas Tech Univ., Lubbock, TX, USA
  • fYear
    2011
  • fDate
    19-23 June 2011
  • Firstpage
    207
  • Lastpage
    211
  • Abstract
    This paper describes a 2nd-generation system for directly studying the emission of vacuum ultraviolet (VUV) light from pulsed dielectric surface flashover at atmospheric pressure. The role of self-produced VUV emission (i.e. energies greater than 7 eV) on photo-ionization processes during the early nanoseconds of pulsed discharges is virtually unexplored, and yet could be a significant factor in the physics of fast breakdown of directed energy systems (such as MW-class high power microwave devices) in the aerospace community. First generation experiments at Texas Tech University have shown that VUV emission corresponding to nitrogen and oxygen excitation in the energy range 8-10 eV is easily produced, but the use of MgF2 optics inhibited future work with existing hardware due to the transmission cutoff of this dielectric material and chromatic aberration if used as a lensing medium. In an effort to enhance the detection capabilities of our hardware in the wavelength range from 115-135 nm, the current system utilizes a custom designed set of off-axis parabolic MgF2-Aluminium coated mirrors as the primary focusing element. High resolution spectroscopy with the upgraded system resulted in the observation of the nitrogen doublet at 149.5 nm, leading to a better fit for the appropriate line broadening parameters for an approximate 10 eV Boltzmann electronic temperature. Evidence of self-absorption for HI (121.5 nm) provides new insight into the generation of space charge in these plasma structures, which has been investigated quantitatively in both SF6-H2 and N2-H2 mixtures.
  • Keywords
    aberrations; aluminium; dielectric materials; microwave devices; nitrogen; nitrogen compounds; oxygen; photoionisation; sulphur compounds; ultraviolet spectroscopy; Al; MW-class high power microwave devices; MgF2; N; N2-H2; O; SF6-H2; Texas Tech University; aerospace community; atmospheric pressure; chromatic aberration; dielectric material; electron volt energy 8 eV to 10 eV; nanosecond-scale spectroscopy; photo-ionization processes; pulsed atmospheric discharges; pulsed dielectric surface flashover; vacuum ultraviolet emission; vacuum ultraviolet light; wavelength 115 nm to 135 nm; wavelength 121.5 nm; wavelength 149.5 nm; Dielectrics; Discharges; Flashover; Nickel; Plasmas; Sulfur hexafluoride; Surface discharges;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Pulsed Power Conference (PPC), 2011 IEEE
  • Conference_Location
    Chicago, IL
  • ISSN
    2158-4915
  • Print_ISBN
    978-1-4577-0629-5
  • Type

    conf

  • DOI
    10.1109/PPC.2011.6191416
  • Filename
    6191416