DocumentCode
1945728
Title
Controlling the interfacial reactions in Pb-free interconnections by adding minor alloying elements to Sn-rich solders
Author
Kang, Sung K. ; Moon Gi Cho ; Shih, Da-Yuan ; Seo, Sun-Kyoung ; Hyuck Mo Lee
Author_Institution
IBM T.J. Watson Res. Center, Yorktown Heights, NY
fYear
2008
fDate
27-30 May 2008
Firstpage
478
Lastpage
484
Abstract
In microelectronic packaging, the reliability of Pb-free solder joint is critically depending on its interfacial reactions with Under-Bump-Metallurgy (UBM) or pad finishes. Factors such as intermetallic compound (IMC) formation, IMC spalling, UBM dissolution, interfacial void formation, all affects the integrity of solder joints. The failure mechanisms in thermal fatigue or electromigration tests of solder joints are often influenced by the interfacial reactions. When Sn-rich solders are used for Pb-free applications, the interfacial reactions become more aggressive since the reflow temperatures of Sn-rich solders are higher than eutectic Sn-Pb solders and the corresponding solubility of barrier metals in a molten Sn-rich solder is expected to be much higher. Recently, many studies have been conducted to control the reaction or consumption rate of a Cu layer into Sn-rich solders. However, few studies have been reported on the consumption of Ni barrier layers in Sn-rich solders during reflow. In addition, it has been known that the dissolution rate of a Ni layer varies widely depending on its material deposition processes and parameters, such as electrolytic, electroless or sputtered Ni. In microelectronic applications, an electroless Ni (P) layer is commonly used to provide a reaction barrier layer on Cu pads of laminates or modules, while an electrolytic or sputtered Ni layer is used in a UBM structure of a flip-chip metallization. In this study, the consumption rate of different Ni layers (sputtered, electrolytic and electroless plated) are investigated with several Sn-rich solders, such as Sn-Ag and Sn-Cu in terms of reflow conditions. A method of controlling the consumption of Ni barrier layers is also reported by adding minor alloying elements, such as Ni or Cu into Sn-rich solders. The controlling mechanisms of Ni consumption are discussed for different alloying elements. The effects of minor alloying elements on the mechanical and thermal properties of Sn-ric- h solders are also reported.
Keywords
alloying; copper alloys; dissolving; nickel alloys; reflow soldering; silver alloys; solders; solubility; surface chemistry; thermal stress cracking; tin alloys; voids (solid); Pb-free solders; Sn-Ag-Ni; Sn-Cu-Ni; barrier metals; dissolution rate; electromigration tests; interfacial reactions; interfacial void formation; intermetallic compound formation; pad finishes; reflow temperatures; solder joint; solubility; thermal fatigue; under-bump-metallurgy; Alloying; Electromigration; Failure analysis; Fatigue; Intermetallic; Microelectronics; Packaging; Soldering; Temperature; Testing;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic Components and Technology Conference, 2008. ECTC 2008. 58th
Conference_Location
Lake Buena Vista, FL
ISSN
0569-5503
Print_ISBN
978-1-4244-2230-2
Electronic_ISBN
0569-5503
Type
conf
DOI
10.1109/ECTC.2008.4550015
Filename
4550015
Link To Document