Title :
3D flip-up structure of porous silicon with actuator and optical filter for microspectrometer applications
Author :
Lammel, G. ; Renaud, P.
Author_Institution :
Inst. of Microsyst., Swiss Fed. Inst. of Technol., Lausanne, Switzerland
Abstract :
This paper reports a new fabrication method for a microactuated tunable optical filter based on porous silicon formation followed by electropolishing. This surface micromachining process generates in a single step a multilayered optical interference filter, releases it from the substrate and lifts it out of plane. The filter can be tilted by a thermal bimorph actuator in order to tune the wavelength it transmits or reflects. The fabrication process uses only two photolithography levels on ordinary silicon p+ substrates. Large, flat, actuatable flip-up Bragg mirrors of porous silicon have been realized with a typical thickness of 30 μm and areas ranging from 250 by 750 μm to 2400 by 4000 μm. Their capability to distinguish light sources with a wavelength separation of less than 20 nm in the visible is presented
Keywords :
anodisation; electrolytic polishing; elemental semiconductors; etching; interference filters; micro-optics; microactuators; micromachining; mirrors; optical multilayers; photolithography; porous semiconductors; silicon; visible spectrometers; 2400 micron; 250 micron; 30 micron; 3D flip-up structure; 4000 micron; 750 micron; Si; actuatable flip-up Bragg mirrors; electropolishing; fabrication method; freestanding micromirrors; low wavelength separation; microactuated tunable optical filter; microspectrometer application; multilayered optical interference filter; oxidation; photolithography; porous silicon; surface micromachining process; thermal bimorph actuator; thermal cut-off; Actuators; Interference; Light sources; Lithography; Micromachining; Mirrors; Optical device fabrication; Optical filters; Optical surface waves; Silicon;
Conference_Titel :
Micro Electro Mechanical Systems, 2000. MEMS 2000. The Thirteenth Annual International Conference on
Conference_Location :
Miyazaki
Print_ISBN :
0-7803-5273-4
DOI :
10.1109/MEMSYS.2000.838503