Title :
Measurement and modeling of size and proximity effects in conductor linewidths
Author :
Lieneweg, Udo ; Zamani, Nasser
Author_Institution :
Center for Space Microelectronics Technol., California Inst. of Technol., Pasadena, CA, USA
Abstract :
The widths of refractory metal, gold, and Permalloy lines were measured as a function of design width Wi and design spacing Sj using an electrical test structure, the cross-quad-bridge resistor. The data were characterised by the following: a constant linewidth aberration ΔW; a characteristic size effect width Wc; and a characteristic proximity effect spacing Sc . With both characteristic dimensions around |c|≈|S c|≈0.4 μm, the effects on a design with W1≈S1≈1.2 μm are about (Wc/W 1)2≈10% each
Keywords :
Permalloy; gold; integrated circuit testing; metallisation; spatial variables measurement; Au; Au lines; Permalloy lines; characteristic dimensions; conductor linewidths; constant linewidth aberration; cross-quad-bridge resistor; design spacing; design width; electrical test structure; proximity effects; refractory metal lines; Conductors; Etching; Laboratories; Microelectronics; Propulsion; Proximity effect; Resistors; Size measurement; Space technology; Testing;
Conference_Titel :
Microelectronic Test Structures, 1994. ICMTS 1994. Proceedings of the 1994 International Conference on
Conference_Location :
San Diego, CA
Print_ISBN :
0-7803-1757-2
DOI :
10.1109/ICMTS.1994.303503
