DocumentCode
1947793
Title
A Novel Approach for an Electrical Vernier to Measure Mask Misalignment
Author
Walton, A.J. ; Ward, D. ; Robertson, J.M ; Holwill, R.J.
Author_Institution
Edinburgh Microfabrication Facility, Department of Electrical Engineering, Kings Buildings, University of Edinburgh, Edinburgh, EH9 3JL, UK.
fYear
1989
fDate
11-14 Sept. 1989
Firstpage
950
Lastpage
953
Abstract
A novel interconnect scheme is presented which reduces the number of pads required by electrical verniers to measure mask misalignment. It makes the use of a shift register no longer necessary to keep the pad count to a reasonable number and the process is only required to support the fabrication of diodes. The vernier can be measured using any test equipment which can test for continuity.
Keywords
Circuit testing; Density measurement; Diodes; Electric variables measurement; Integrated circuit interconnections; Integrated circuit testing; Shift registers; Teeth; Time measurement; Winches;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid State Device Research Conference, 1989. ESSDERC '89. 19th European
Conference_Location
Berlin, Germany
Print_ISBN
0387510001
Type
conf
Filename
5437060
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