Title :
Direct writing for three-dimensional microfabrication using synchrotron radiation etching
Author :
Katoh, Takanori ; Nishi, Nobuyoshi ; Fukagawa, Masafumi ; Ueno, Hiroshi ; Sugiyama, Susumu
Author_Institution :
Sumitomo Heavy Ind. Ltd., Tanashi, Japan
Abstract :
This paper presents rapid three-dimensional microfabrication technologies for PTFE by direct writing with the TIEGA process, a LIGA-like process which replaces hard X-ray lithography with synchrotron radiation (SR) direct photo-etching. The etching rates of this process are of the order of 6-100 μm/min, depending on the photon flux of the SR light. An X-ray lathe has been modified into an SR etching lathe to form cylindrical, helical, pyramidal, ellipsoidal, and other nonplanar objects. A metallic wire covered with a PTFE sheet is rotated and/or moved while being irradiated with SR through a mask. Moreover, direct writing without using any masks has been developed, by combining a scanning stage with a high degree of freedom under an He atmosphere, for creating any microstructure. The capabilities of these technologies and initial fabrication results are described here
Keywords :
LIGA; etching; micromechanical devices; synchrotron radiation; LIGA-like process; PTFE; TIEGA process; X-ray lathe; direct photo-etching; direct writing; etching rates; initial fabrication results; nonplanar objects; photon flux; scanning stage; synchrotron radiation etching; three-dimensional microfabrication; Atmosphere; Etching; Fabrication; Helium; Microstructure; Strontium; Synchrotron radiation; Wire; Writing; X-ray lithography;
Conference_Titel :
Micro Electro Mechanical Systems, 2000. MEMS 2000. The Thirteenth Annual International Conference on
Conference_Location :
Miyazaki
Print_ISBN :
0-7803-5273-4
DOI :
10.1109/MEMSYS.2000.838578
