Title :
Oscillatory transport instabilities and current filamentation in semiconductor structures
Author :
Scholl, Eckehard
Author_Institution :
Inst. fuer Theoretische Phys., Tech. Univ. Berlin, Germany
Abstract :
Summary form only given. Instabilities associated with nonlinear electrical transport of hot electrons are widespread in semiconductor devices driven far from thermodynamic equilibrium. The theory of such instabilities is reviewed with a special emphasis on recent progress in the description of current filaments. The theoretical approach is based on quasi-hydrodynamic nonlinear balance equations for the electron plasma coupled with Maxwell´s equations for the electric and, where applicable, magnetic field. The instabilities can be considered as nonequilibrium phase transitions. The theoretical tools of nonlinear dynamic systems are applied to describe the emergence of self-organized dynamic spatiotemporal structures; the nucleation and growth of current filaments, their interaction via global couplings through the external circuit, periodic and chaotic oscillatory instabilities in the form of breathing or spiking filaments, and filaments traveling laterally in a regular or intermittent way.
Keywords :
hot carriers; Maxwell´s equations; breathing filaments; chaotic oscillatory instabilities; current filamentation; current filaments; electric field; electron plasma; external circuit; global couplings; growth; hot electrons; lateral travel; magnetic field; nonequilibrium phase transitions; nonlinear dynamic systems; nonlinear electrical transport; nucleation; oscillatory transport instabilities; periodic oscillatory instability; quasi-hydrodynamic nonlinear balance equations; self-organized dynamic spatiotemporal structures; semiconductor devices; semiconductor structures; spiking filaments; thermodynamic equilibrium; Couplings; Electrons; Magnetic fields; Maxwell equations; Nonlinear equations; Plasma devices; Plasma transport processes; Semiconductor devices; Spatiotemporal phenomena; Thermodynamics;
Conference_Titel :
Plasma Science, 1993. IEEE Conference Record - Abstracts., 1993 IEEE International Conference on
Conference_Location :
Vancouver, BC, Canada
Print_ISBN :
0-7803-1360-7
DOI :
10.1109/PLASMA.1993.593530