• DocumentCode
    1948225
  • Title

    Silicon-on-Diamond Technology

  • Author

    Annamalai, N.K. ; Fechner, Paul ; Sawyer, Jon

  • Author_Institution
    Department of Electrical and Computer Engineering, Northeastern University, Boston, MA
  • fYear
    1992
  • fDate
    6-8 Oct. 1992
  • Firstpage
    64
  • Lastpage
    65
  • Keywords
    Capacitance-voltage characteristics; Conducting materials; Dielectrics and electrical insulation; Integrated circuit technology; MISFETs; MOS capacitors; Silicon on insulator technology; Substrates; Temperature; Thermal conductivity;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    SOI Conference, 1992. IEEE International
  • Conference_Location
    Ponte Vedra Beach, FL
  • ISSN
    1078-621X
  • Print_ISBN
    0-7803-7439-8
  • Type

    conf

  • DOI
    10.1109/SOI.1992.664796
  • Filename
    664796
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1948225