Title :
A novel bi-directional magnetic microactuator using electroplated permanent magnet arrays with vertical anisotropy
Author :
Cho, Hyoung J. ; Ahn, Chong H.
Author_Institution :
Dept. of Electr. & Comput. Eng. & Comput. Sci., Cincinnati Univ., OH, USA
Abstract :
A novel bi-directional magnetic microactuator using electroplated permanent magnet arrays has been fabricated and tested in this work. To realize the microactuator, a new electroplating technique has been developed to improve vertical magnetic anisotropy in CoNiMnP-based permanent magnet arrays. By applying magnetic field during electroplating, vertical coercivity and remanence have been increased up to 1100 Oe and 1900 G. After electroplating the magnet arrays at the tip of a prototype silicon cantilever beam, bi-directional magnetic actuation has been successfully achieved by exciting an integrated electromagnet under the beam
Keywords :
arrays; cobalt alloys; coercive force; electromagnetic actuators; electroplating; magnetic anisotropy; manganese alloys; microactuators; nickel alloys; permanent magnets; phosphorus alloys; remanence; CoNiMnP; CoNiMnP-based magnet; aspect ratio; bidirectional magnetic microactuator; electroplated permanent magnet arrays; electroplating technique; etching; hysteresis loops; integrated electromagnet; optimum plating; prototype silicon cantilever beam; remanence; vertical anisotropy control; vertical coercivity; Bidirectional control; Coercive force; Magnetic anisotropy; Magnetic fields; Microactuators; Micromagnetics; Permanent magnets; Perpendicular magnetic anisotropy; Structural beams; Testing;
Conference_Titel :
Micro Electro Mechanical Systems, 2000. MEMS 2000. The Thirteenth Annual International Conference on
Conference_Location :
Miyazaki
Print_ISBN :
0-7803-5273-4
DOI :
10.1109/MEMSYS.2000.838601
