• DocumentCode
    1948536
  • Title

    Metal Gates for 0.15 um CMOS and beyond

  • Author

    Webster, M.N. ; Roes, R.F.M. ; van Brandenburg, A.C.M.C. ; KLOOTWI, J.H. ; Zegers, A.T.A.

  • Author_Institution
    Philips Research Laboratories, Eindhoven, The Netherlands
  • Volume
    1
  • fYear
    1999
  • fDate
    13-15 Sept. 1999
  • Firstpage
    148
  • Lastpage
    151
  • Keywords
    Artificial intelligence; CMOS process; Capacitance-voltage characteristics; Conducting materials; Current measurement; Density measurement; Frequency measurement; MOSFETs; Tin; Tunneling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Device Research Conference, 1999. Proceeding of the 29th European
  • Conference_Location
    Leuven, Belgium
  • Print_ISBN
    2-86332-245-1
  • Type

    conf

  • Filename
    1505461
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1948536