Gate polysilicon optimization for deep-submicron MOSFETs

Author

Schmitz, J. ; Tuinhout, H.P. ; Montree, A.H. ; Ponomarev, Y.V. ; Stolk, P.A. ; Woerlee, P.H.

Author_Institution

Philips Research Laboratories, Eindhoven, The Netherlands

Volume

fYear

1999

fDate

13-15 Sept. 1999

Firstpage

156

Lastpage

159

Keywords

CMOS process; Capacitors; Doping; Fabrication; Grain size; MOS devices; MOSFETs; Scanning electron microscopy; Silicon; Temperature;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid-State Device Research Conference, 1999. Proceeding of the 29th European

Conference_Location

Leuven, Belgium

Print_ISBN

2-86332-245-1

Type

Filename

1505463

Link To Document