Title :
Gate polysilicon optimization for deep-submicron MOSFETs
Author :
Schmitz, J. ; Tuinhout, H.P. ; Montree, A.H. ; Ponomarev, Y.V. ; Stolk, P.A. ; Woerlee, P.H.
Author_Institution :
Philips Research Laboratories, Eindhoven, The Netherlands
Keywords :
CMOS process; Capacitors; Doping; Fabrication; Grain size; MOS devices; MOSFETs; Scanning electron microscopy; Silicon; Temperature;
Conference_Titel :
Solid-State Device Research Conference, 1999. Proceeding of the 29th European
Conference_Location :
Leuven, Belgium
Print_ISBN :
2-86332-245-1
