• DocumentCode
    1948608
  • Title

    Impact of Plasma Density and Pattern Aspect Ratio on Plasma Damage in deep submicron CMOS technologies

  • Author

    Creusen, Martin ; Van den bosch, G. ; van der Groen, S. ; Groeseneken, Guido ; Ackaert, Jan ; De Backer, Eddy

  • Author_Institution
    IMEC, Leuven, Belgium
  • Volume
    1
  • fYear
    1999
  • fDate
    13-15 Sept. 1999
  • Firstpage
    164
  • Lastpage
    167
  • Keywords
    CMOS process; CMOS technology; Dielectric losses; Electrons; Plasma applications; Plasma density; Plasma devices; Plasma materials processing; Sputter etching; Testing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Device Research Conference, 1999. Proceeding of the 29th European
  • Conference_Location
    Leuven, Belgium
  • Print_ISBN
    2-86332-245-1
  • Type

    conf

  • Filename
    1505465
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1948608