• DocumentCode
    1949139
  • Title

    Process variation in nano-scale memories: failure analysis and process tolerant architecture

  • Author

    Agarwal, Amit ; Paul, Bipul C. ; Roy, Kaushik

  • Author_Institution
    Sch. of Electr. & Comput. Eng., Purdue Univ., West Lafayette, IN, USA
  • fYear
    2004
  • fDate
    3-6 Oct. 2004
  • Firstpage
    353
  • Lastpage
    356
  • Abstract
    In this paper, we analyze the impact of process variation on the different failure mechanisms in SRAM cells. We also propose a process tolerant cache architecture suitable for high performance memory. This technique surpasses all the contemporary fault tolerant schemes such as row/column redundancy and ECC in handling failures due to process variation. Experimental results on a 64K cache show that the proposed technique can achieve 94% yield compared to its original 33% yield (standard cache) in 45nm predictive technology.
  • Keywords
    SRAM chips; cache storage; failure analysis; fault tolerance; integrated circuit reliability; integrated circuit technology; integrated circuit testing; nanoelectronics; redundancy; 45 nm; 64 K; ECC; SRAM cells; cache yield; failure analysis; fault tolerant schemes; high performance memory; nano-scale memories; predictive technology; process tolerant architecture; process tolerant cache architecture; process variation; row/column redundancy; Computer architecture; Error correction; Error correction codes; Failure analysis; Fault tolerance; Random access memory; Redundancy; Silicon; Stability; Threshold voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Custom Integrated Circuits Conference, 2004. Proceedings of the IEEE 2004
  • Print_ISBN
    0-7803-8495-4
  • Type

    conf

  • DOI
    10.1109/CICC.2004.1358819
  • Filename
    1358819