DocumentCode :
1949865
Title :
The Effect of Thin Oxide Layers on Shallow Junction Formation
Author :
Stolk, P.A. ; Schmitz, J. ; Cubaynes, F.N. ; van Brandenburg, A.C.M.C. ; van Berkum, J.G.M. ; van de Wijgert, W.G. ; Roozeboom, F.
Author_Institution :
Philips Research Laboratories, Eindhoven, The Netherlands
Volume :
1
fYear :
1999
fDate :
13-15 Sept. 1999
Firstpage :
428
Lastpage :
431
Keywords :
Electric resistance; Etching; Fabrication; Furnaces; Implants; Oxidation; Rapid thermal annealing; Reproducibility of results; Strontium;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Device Research Conference, 1999. Proceeding of the 29th European
Conference_Location :
Leuven, Belgium
Print_ISBN :
2-86332-245-1
Type :
conf
Filename :
1505531
Link To Document :
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