Title :
Electron flows in a low voltage gap exposed to an oblique external magnetic field
Author :
Garner, A.L. ; Lau, Y.Y. ; Chernin, D.
Author_Institution :
Michigan Univ., Ann Arbor, MI, USA
Abstract :
Summary form only given, as follows. It was recently found that steady-state cycloidal electron flows in a crossed-field gap are easily disrupted to a turbulent state, either by the presence of a small rf electric field across the gap, or by a small resistance. Such a collapse is insensitive to the level of the emitted current, and is amenable to a one-dimensional analysis. In the other limit where the external magnetic field is parallel to the gap´s electric field, such a collapse is not expected if the emitted current is below the Child-Langmuir value. In this paper, we investigate the general case where the external magnetic field is at an arbitrary angle with respect to the electric field. One-dimensional theories and simulations (PDP1) will be presented on the equilibrium, stability, and turbulent state of electron flows in such a low voltage (non-relativistic) gap. Implications for the noise generation in O-type and M-type electron guns are discussed.
Keywords :
discharges (electric); electric fields; electron guns; magnetic fields; plasma simulation; plasma transport processes; plasma turbulence; Child-Langmuir value; M-type electron guns; O-type electron guns; RF electric field; crossed-field gap; electric field; electron flows; equilibrium state; external magnetic field; low voltage gap; noise generation; nonrelativistic gap; oblique external magnetic field; one-dimensional analysis; one-dimensional theories; simulations; stability state; steady-state cycloidal electron flows; turbulent state; Cleaning; Diodes; Electron beams; Ion beams; Laboratories; Lithium; Low voltage; Magnetic fields; Particle beams; Plasma sources;
Conference_Titel :
Plasma Science, 1997. IEEE Conference Record - Abstracts., 1997 IEEE International Conference on
Conference_Location :
San Diego, CA, USA
Print_ISBN :
0-7803-3990-8
DOI :
10.1109/PLASMA.1997.605254