Characterization of super-resolution photolithography

Author

Fukuda, H. ; Yamanaka, R. ; Terasawa, T. ; Hama, K. ; Tawa, T. ; Okazaki, S.

Author_Institution

Central Res. Lab., Hitachi Ltd., Tokyo, Japan

fYear

1992

fDate

13-16 Dec. 1992

Firstpage

49

Lastpage

52

Abstract

A pupil filtering lens system for improving depth of focus and resolution is introduced. The effectiveness of the pupil filtering lens system, which uses the Super-FLEX filter for window patterns and a high spatial frequency enhancing filter for periodical patterns, is discussed. Using these filters, it is possible to achieve 0.2-0.3 mu m patterns without phase-shift masks. The depth of focus and the practical resolution are compared for various super-resolution optical lithography methods. Preliminary experimental results from the pupil filtering lens were obtained, and the effect of the super-FLEX filter is confirmed.<>

Keywords

lenses; optical filters; photolithography; spatial filters; 0.2 to 0.3 micron; Super-FLEX filter; depth of focus; optical lithography; periodical patterns; pupil filtering lens system; resolution; spatial frequency enhancing filter; super-resolution photolithography; window patterns; Lenses; Optical filters; Photolithography; Spatial filters;

fLanguage

English

Publisher

ieee

Conference_Titel

Electron Devices Meeting, 1992. IEDM '92. Technical Digest., International

Conference_Location

San Francisco, CA, USA

ISSN

0163-1918

Print_ISBN

0-7803-0817-4

Type

conf

DOI

10.1109/IEDM.1992.307306

Filename

307306