• DocumentCode
    1951682
  • Title

    Two-dimensional simulation of stress induced orientation effect in self-aligned GaAs MESFETs

  • Author

    Lo, S.-H. ; Lee, C.-P.

  • Author_Institution
    Inst. of Electron., Nat. Chiao Tung Univ., Hsin Chu, Taiwan
  • fYear
    1989
  • fDate
    22-25 Oct. 1989
  • Firstpage
    281
  • Lastpage
    284
  • Abstract
    The stress-induced orientation effects in self-aligned GaAs MESFETs have been studied using a two-dimensional analysis. Devices oriented along different crystal directions, with different gate lengths and under different stress conditions, were studied. It was found that the piezoelectric effect caused by the surface stress plays a very important role in the device characteristics of short-channel self-aligned MESFETs. The short-channel effects can be suppressed and the device performance improved if the devices are oriented in the right direction and the thickness and the stress of the surface dielectric layer are properly chosen.<>
  • Keywords
    III-V semiconductors; Schottky gate field effect transistors; gallium arsenide; piezoelectricity; semiconductor device models; 2D simulation; GaAs; piezoelectric effect; self-aligned MESFETs; short-channel effects; stress induced orientation effect; surface dielectric layer; surface stress; two-dimensional analysis; Capacitive sensors; Compressive stress; Dielectric substrates; Difference equations; Electrons; FETs; Gallium arsenide; MESFETs; Piezoelectric effect; Threshold voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Gallium Arsenide Integrated Circuit (GaAs IC) Symposium, 1989. Technical Digest 1989., 11th Annual
  • Conference_Location
    San Diego, CA, USA
  • Type

    conf

  • DOI
    10.1109/GAAS.1989.69343
  • Filename
    69343