DocumentCode
1951682
Title
Two-dimensional simulation of stress induced orientation effect in self-aligned GaAs MESFETs
Author
Lo, S.-H. ; Lee, C.-P.
Author_Institution
Inst. of Electron., Nat. Chiao Tung Univ., Hsin Chu, Taiwan
fYear
1989
fDate
22-25 Oct. 1989
Firstpage
281
Lastpage
284
Abstract
The stress-induced orientation effects in self-aligned GaAs MESFETs have been studied using a two-dimensional analysis. Devices oriented along different crystal directions, with different gate lengths and under different stress conditions, were studied. It was found that the piezoelectric effect caused by the surface stress plays a very important role in the device characteristics of short-channel self-aligned MESFETs. The short-channel effects can be suppressed and the device performance improved if the devices are oriented in the right direction and the thickness and the stress of the surface dielectric layer are properly chosen.<>
Keywords
III-V semiconductors; Schottky gate field effect transistors; gallium arsenide; piezoelectricity; semiconductor device models; 2D simulation; GaAs; piezoelectric effect; self-aligned MESFETs; short-channel effects; stress induced orientation effect; surface dielectric layer; surface stress; two-dimensional analysis; Capacitive sensors; Compressive stress; Dielectric substrates; Difference equations; Electrons; FETs; Gallium arsenide; MESFETs; Piezoelectric effect; Threshold voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Gallium Arsenide Integrated Circuit (GaAs IC) Symposium, 1989. Technical Digest 1989., 11th Annual
Conference_Location
San Diego, CA, USA
Type
conf
DOI
10.1109/GAAS.1989.69343
Filename
69343
Link To Document