Title :
A new vector 2D photolithography simulation tool
Author :
Lucas, K. ; Strojwas, A.J.
Author_Institution :
Dept. of Electr. & Comput. Eng., Carnegie Mellon Univ., Pittsburgh, PA, USA
Abstract :
A new vector optical lithography simulator, METROPOLE, is presented. Rigorous simulations run quickly on a workstation for complex 2D regular and phase shifting masks, substrate bleaching, optical metrology and alignment problems. An analysis of a novel phase shifting techniques is undertaken to highlight the usefulness of the program.<>
Keywords :
digital simulation; electronic engineering computing; masks; photolithography; semiconductor process modelling; METROPOLE; alignment problems; optical lithography simulator; optical metrology; phase shifting masks; substrate bleaching; vector 2D photolithography simulation tool; workstation; Masks; Photolithography; Semiconductor process modeling; Simulation;
Conference_Titel :
Electron Devices Meeting, 1992. IEDM '92. Technical Digest., International
Conference_Location :
San Francisco, CA, USA
Print_ISBN :
0-7803-0817-4
DOI :
10.1109/IEDM.1992.307336
