DocumentCode :
1952578
Title :
An improved method for determining the inversion layer mobility of electrons in trench MOSFETs
Author :
van den Heuvel, M.G.L. ; Hueting, R.J.E. ; Hijzen, E.A. ; Zandt, M. A A in´t
Author_Institution :
Fac. of Appl. Phys., Twente Univ., Enschede, Netherlands
fYear :
2003
fDate :
14-17 April 2003
Firstpage :
173
Lastpage :
176
Abstract :
For the first time trench sidewall effective electron mobility (μeff) values were determined by using the split capacitance-voltage (CV) method for a large range of transversal effective field (Eeff) from 0.1 up to 1.4 MV/cm. The influences of crystal orientation, doping concentration and, for the first time, temperature were investigated. In conclusion, the results show that (1) the split CV method is an accurate method for determining μeff(Eeff) data in trench MOSFETs, (2) the {100} μeff data approach published data of planar MOSFETs for high Eeff and (3) the mobility behavior can be explained with generally accepted scattering models for the entire range of Eeff. The results are important for the optimization of trench power devices.
Keywords :
MOSFET; capacitance measurement; electron mobility; inversion layers; semiconductor device measurement; voltage measurement; crystal orientation; doping concentration; inversion layer mobility; mobility behavior; planar MOSFET; split capacitance-voltage; trench MOSFET; trench sidewall effective electron mobility; Capacitance-voltage characteristics; Current measurement; Doping; Electrochemical machining; Electron mobility; MOSFETs; Physics; Scattering; Shape; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Power Semiconductor Devices and ICs, 2003. Proceedings. ISPSD '03. 2003 IEEE 15th International Symposium on
Print_ISBN :
0-7803-7876-8
Type :
conf
DOI :
10.1109/ISPSD.2003.1225257
Filename :
1225257
Link To Document :
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