DocumentCode :
1952598
Title :
Overview of SiGe technology modeling and application
Author :
Yuan, Jiann S.
Author_Institution :
Sch. of Electr. Eng. & Comput. Sci., Central Florida Univ., Orlando, FL, USA
fYear :
2000
fDate :
2000
Firstpage :
67
Lastpage :
72
Abstract :
Advances in wireless communications and information processing systems require implementation of very high performance electronic systems. In recent years, SiGe heterojunction bipolar transistors (HBTs) have emerged as one of the leading contenders to satisfy these demands. The low emitter-base turn-on voltage and device scaling significantly reduce power consumption in circuit operation, while maintaining high speed. With the increasing demand placed on voice and data communications, transmitting, receiving and processing information at high frequencies and high speeds, the use of SiGe bipolar transistors becomes increasingly important
Keywords :
Ge-Si alloys; UHF integrated circuits; bipolar MMIC; heterojunction bipolar transistors; low-power electronics; semiconductor materials; MMIC; SiGe; device scaling; emitter-base turn-on voltage; heterojunction bipolar transistors; information processing systems; power consumption; technology modeling; wireless communications; Circuits; Data communication; Energy consumption; Germanium silicon alloys; Heterojunction bipolar transistors; Information processing; Low voltage; Power system modeling; Silicon germanium; Wireless communication;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Quality Electronic Design, 2000. ISQED 2000. Proceedings. IEEE 2000 First International Symposium on
Conference_Location :
San Jose, CA
Print_ISBN :
0-7695-0525-2
Type :
conf
DOI :
10.1109/ISQED.2000.838856
Filename :
838856
Link To Document :
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