• DocumentCode
    1953064
  • Title

    Competitive 5V-thin and 12V-thick dual gate technology isolated drain LDMOS devices

  • Author

    Ramanathan, R. ; Pendharkar, S. ; Zheng, L. ; Efland, T. ; Grant, D. ; Briggs, D.

  • Author_Institution
    Texas Instruments Inc., Dallas, TX, USA
  • fYear
    2003
  • fDate
    14-17 April 2003
  • Firstpage
    257
  • Lastpage
    260
  • Abstract
    Integrated power FETs in dc-dc converters should have good CHC rating so the on-resistance of the FETs does not walk outside its guaranteed limits over its intended lifetime thereby increasing the power losses. Planar devices are somewhat limited by CHC physics of gate oxide and drain engineering and not BVdss. The device presented at ISPSD02 was re-engineered in the quest for an isolated FET with BVdss greater than 22V, and meeting the system requirements for a 16V product rating. Data for thin (150 Å) and thick gate versions (425 Å) of the same device style in a 0.72μm technology is presented along with 2D simulation results. The thick gate version shows a slight improvement but not enough to meet the above requirements. Much improved data for a re-engineered device is presented.
  • Keywords
    MOS integrated circuits; isolation technology; power MOSFET; semiconductor device models; simulation; 0.72 micron; 12 V; 16 V; 2D simulation result; 5 V; dc-dc converter; drain engineering; dual gate technology; gate oxide; integrated power FET; isolated drain LDMOS device; planar device; power loss; thick gate version; BiCMOS integrated circuits; DC-DC power converters; Data engineering; Doping; FETs; Instruments; Isolation technology; Low voltage; Physics; Power engineering and energy;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Power Semiconductor Devices and ICs, 2003. Proceedings. ISPSD '03. 2003 IEEE 15th International Symposium on
  • Print_ISBN
    0-7803-7876-8
  • Type

    conf

  • DOI
    10.1109/ISPSD.2003.1225277
  • Filename
    1225277