DocumentCode :
1953385
Title :
Ge semiconductor devices for cryogenic power electronics: Part III
Author :
Ward, R.R. ; Dawson, W.J. ; Zhu, L. ; Kirschman, R.K. ; Mueller, O. ; Patterson, R.L. ; Dickman, J.E. ; Hammoud, A.
Author_Institution :
GPD Optoelectronics Corp., Salem, NH, USA
fYear :
2003
fDate :
14-17 April 2003
Firstpage :
321
Lastpage :
324
Abstract :
We have begun development of Ge power diodes and transistor for operation at cryogenic temperatures, down to ∼ 20 K (∼ -250°C), for use in spacecraft that will encounter low-temperature environments. Ge devices have advantages over Si devices for such deep cryogenic operation. Our initial development has yielded 10-A diodes with low forward voltage and reverse leakage, and reverse breakdown up to ∼ 400 V, as well as insulated-gate FETs, both operating down to ∼ 4 K (∼ minus; 270°C).
Keywords :
cryogenic electronics; elemental semiconductors; germanium; insulated gate field effect transistors; power electronics; power field effect transistors; power semiconductor diodes; silicon; 10 A; 20 K; 20 to 250 C; 270 to 270 C; 4 K; 400 V; Ge; Ge power diodes; Ge semiconductor devices; Ge transistor; Si; cryogenic power electronics; cryogenic temperature; low forward voltage; low reverse leakage; low-temperature environments; Breakdown voltage; Cryogenics; FETs; Insulation; Low voltage; Power electronics; Semiconductor devices; Semiconductor diodes; Space vehicles; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Power Semiconductor Devices and ICs, 2003. Proceedings. ISPSD '03. 2003 IEEE 15th International Symposium on
Print_ISBN :
0-7803-7876-8
Type :
conf
DOI :
10.1109/ISPSD.2003.1225292
Filename :
1225292
Link To Document :
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