Title :
Generation of intense pulsed ion beams of high-quality
Author :
Hashimoto, Y. ; Yatsuzuka, M. ; Sato, M. ; Nobuhara, S.
Author_Institution :
Dept. of Electr. Eng., Himeji Inst. of Technol., Japan
Abstract :
Summary form only given. Generation of intense pulsed ion beams and improvement of beam quality have been studied for the purpose of ion implantation in material developments. It is found that a deterioration of ion beams quality is caused by adsorbed matter on an anode surface. As the adsorbed matter was removed by bombarding the anode with electrons, the improvement of beam quality was studied by successive shots. The experiments were performed using the pulse power generator HARIMA-II (400 kV, 3 /spl Omega/, 50 ns) at the Himeji Institute of Technology. The ion beams were produced by successive shots at intervals of 7 minutes without breaking vacuum. It was found that cleaning of the anode surface by a few initial successive shots was useful for removal of the adsorbed matter on the anode and for generation of high-purity ion beams.
Keywords :
ion beams; 3 ohm; 400 kV; 50 ns; HARIMA-II; adsorbed matter; anode surface; beam quality; high-purity ion beams; intense pulsed ion beams; ion implantation; material developments; pulse power generator; Aluminum alloys; Anodes; Diodes; Hydrogen; Ion accelerators; Ion beams; Laboratories; Particle accelerators; Particle beams; Pulse generation;
Conference_Titel :
Plasma Science, 1993. IEEE Conference Record - Abstracts., 1993 IEEE International Conference on
Conference_Location :
Vancouver, BC, Canada
Print_ISBN :
0-7803-1360-7
DOI :
10.1109/PLASMA.1993.593558
