Title :
Plasma thinned SOI bonded wafers
Author :
Mumola, P.B. ; Gardopee, G.J. ; Clapis, P.J. ; Zarowin, C.B. ; Bollinger, L.D. ; Ledger, A.M.
Author_Institution :
Hughes Danbury Optical Systems, Inc., Danbury, CT
Keywords :
High speed optical techniques; Optical films; Optical materials; Plasma applications; Plasma confinement; Plasma density; Plasma materials processing; Plasma measurements; Semiconductor films; Wafer bonding;
Conference_Titel :
SOI Conference, 1992. IEEE International
Conference_Location :
Ponte Vedra Beach, FL
Print_ISBN :
0-7803-7439-8
DOI :
10.1109/SOI.1992.664836
